WO2008146666A1 - 糖アミド誘導体を利用したホウ素吸着材及びホウ素除去方法 - Google Patents

糖アミド誘導体を利用したホウ素吸着材及びホウ素除去方法 Download PDF

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Publication number
WO2008146666A1
WO2008146666A1 PCT/JP2008/059305 JP2008059305W WO2008146666A1 WO 2008146666 A1 WO2008146666 A1 WO 2008146666A1 JP 2008059305 W JP2008059305 W JP 2008059305W WO 2008146666 A1 WO2008146666 A1 WO 2008146666A1
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WO
WIPO (PCT)
Prior art keywords
boron
integer
amide derivative
removal method
amide
Prior art date
Application number
PCT/JP2008/059305
Other languages
English (en)
French (fr)
Inventor
Katsumi Yabusaki
Original Assignee
Kowa Company, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kowa Company, Ltd. filed Critical Kowa Company, Ltd.
Priority to JP2009516260A priority Critical patent/JP5503966B2/ja
Priority to US12/600,215 priority patent/US8236180B2/en
Priority to EP08764428A priority patent/EP2149539A4/en
Publication of WO2008146666A1 publication Critical patent/WO2008146666A1/ja

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C235/00Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms
    • C07C235/02Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C235/04Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated
    • C07C235/06Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/22Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/28Treatment of water, waste water, or sewage by sorption
    • C02F1/285Treatment of water, waste water, or sewage by sorption using synthetic organic sorbents
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C235/00Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms
    • C07C235/02Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C235/04Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated
    • C07C235/10Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated having the nitrogen atom of at least one of the carboxamide groups bound to an acyclic carbon atom of a hydrocarbon radical substituted by nitrogen atoms not being part of nitro or nitroso groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C305/00Esters of sulfuric acids
    • C07C305/02Esters of sulfuric acids having oxygen atoms of sulfate groups bound to acyclic carbon atoms of a carbon skeleton
    • C07C305/04Esters of sulfuric acids having oxygen atoms of sulfate groups bound to acyclic carbon atoms of a carbon skeleton being acyclic and saturated
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/001Processes for the treatment of water whereby the filtration technique is of importance
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/66Treatment of water, waste water, or sewage by neutralisation; pH adjustment
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/10Inorganic compounds
    • C02F2101/108Boron compounds
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/16Nature of the water, waste water, sewage or sludge to be treated from metallurgical processes, i.e. from the production, refining or treatment of metals, e.g. galvanic wastes
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/06Controlling or monitoring parameters in water treatment pH
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00Use of specific compounds during water treatment
    • C02F2305/04Surfactants, used as part of a formulation or alone
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S210/00Liquid purification or separation
    • Y10S210/902Materials removed

Abstract

 溶液中のホウ素に対する吸着能に優れ、安価であり、且つ汎用性の高いホウ素吸着材、及び簡便且つ効率的にホウ素を除去することが可能なホウ素除去方法を提供する。アルカリ条件下、一般式(1)で示されるアミド誘導体をホウ素含有水に添加しホウ素を吸着させた後、二価以上のカチオン源を添加することにより、前記アミド体を凝集させて水から分離する。 (式中、mは1又は2を示す。Xは-CH2OH基、-CHO基又は-COOH基を示し、nは2~5の整数を示す。mが2のときX及びnはそれぞれ独立である。Yは、mが1のとき炭素数6~16の一価の炭化水素基を示し、mが2のとき炭素数8~18の二価の炭化水素基を示す。)
PCT/JP2008/059305 2007-05-23 2008-05-21 糖アミド誘導体を利用したホウ素吸着材及びホウ素除去方法 WO2008146666A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009516260A JP5503966B2 (ja) 2007-05-23 2008-05-21 糖アミド誘導体を利用したホウ素吸着材及びホウ素除去方法
US12/600,215 US8236180B2 (en) 2007-05-23 2008-05-21 Boron removal method utilizing sugar amide derivative
EP08764428A EP2149539A4 (en) 2007-05-23 2008-05-21 BORAD SORPTION AGENTS WITH SUGAR AMID DERIVATIVE AND BORON REMOVAL PROCESS

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007136436 2007-05-23
JP2007-136436 2007-05-23

Publications (1)

Publication Number Publication Date
WO2008146666A1 true WO2008146666A1 (ja) 2008-12-04

Family

ID=40074925

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/059305 WO2008146666A1 (ja) 2007-05-23 2008-05-21 糖アミド誘導体を利用したホウ素吸着材及びホウ素除去方法

Country Status (4)

Country Link
US (1) US8236180B2 (ja)
EP (1) EP2149539A4 (ja)
JP (1) JP5503966B2 (ja)
WO (1) WO2008146666A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011212672A (ja) * 2010-03-17 2011-10-27 Toshiba Corp 吸着材用アクリル系樹脂粒子、および水処理用カラム
JP2016053100A (ja) * 2014-09-02 2016-04-14 国立大学法人九州大学 ヒドロゲル化剤

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2976948A1 (fr) * 2011-06-27 2012-12-28 Centre Nat Rech Scient Systeme hydrogelifiant a base de n-alkylaldonamide
JP5670543B1 (ja) * 2013-11-27 2015-02-18 みぞぐち事業株式会社 アルカリ性廃液用凝集中和剤
WO2017105348A1 (en) 2015-12-17 2017-06-22 Singapore University Of Technology And Design Boron removal and measurement in aqueous solutions
US11014830B2 (en) 2016-12-15 2021-05-25 Ada Carbon Solutions, Llc Sorbent compositions for the removal of boron from aqueous mediums
AU2022254142A1 (en) * 2021-04-06 2023-11-02 Carbonet Nanotechnologies Inc. Compositions and methods for removing boron from aqueous solutions

Citations (5)

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JPH01229009A (ja) * 1987-03-04 1989-09-12 Bayer Ag シリカゲルで不動化された光学的に活性な重合体およびそれを使用する方法
JPH05139999A (ja) * 1991-11-25 1993-06-08 Sumika Bunseki Center:Kk キラリテイ識別剤およびクロマトグラフイー用分離剤
US5352386A (en) * 1992-11-25 1994-10-04 Lever Brothers Company Compositions free of boron comprising N-alkylerythronamides and N-alkylxylonamides as surfactants
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JPH01229009A (ja) * 1987-03-04 1989-09-12 Bayer Ag シリカゲルで不動化された光学的に活性な重合体およびそれを使用する方法
JPH05139999A (ja) * 1991-11-25 1993-06-08 Sumika Bunseki Center:Kk キラリテイ識別剤およびクロマトグラフイー用分離剤
US5352386A (en) * 1992-11-25 1994-10-04 Lever Brothers Company Compositions free of boron comprising N-alkylerythronamides and N-alkylxylonamides as surfactants
JP2002030052A (ja) * 2000-07-18 2002-01-29 Tosoh Corp ヒドロキシアミノカルボン酸、その用途、及びその製造法
JP2002173664A (ja) * 2000-12-04 2002-06-21 Nec Corp 表面処理剤、表面処理剤組成物、インクジェットプリンター用ヘッドおよびインクジェットプリンター

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011212672A (ja) * 2010-03-17 2011-10-27 Toshiba Corp 吸着材用アクリル系樹脂粒子、および水処理用カラム
JP2016053100A (ja) * 2014-09-02 2016-04-14 国立大学法人九州大学 ヒドロゲル化剤

Also Published As

Publication number Publication date
JPWO2008146666A1 (ja) 2010-08-19
US20100294722A1 (en) 2010-11-25
EP2149539A1 (en) 2010-02-03
EP2149539A4 (en) 2011-05-11
JP5503966B2 (ja) 2014-05-28
US8236180B2 (en) 2012-08-07

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