WO2013110122A1 - Chromium-based reflective coating - Google Patents

Chromium-based reflective coating Download PDF

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Publication number
WO2013110122A1
WO2013110122A1 PCT/AU2013/000047 AU2013000047W WO2013110122A1 WO 2013110122 A1 WO2013110122 A1 WO 2013110122A1 AU 2013000047 W AU2013000047 W AU 2013000047W WO 2013110122 A1 WO2013110122 A1 WO 2013110122A1
Authority
WO
WIPO (PCT)
Prior art keywords
alloy
chromium
dopant material
coating
reflective coating
Prior art date
Application number
PCT/AU2013/000047
Other languages
French (fr)
Inventor
Drew Raymond EVANS
Kamil Zuber
Colin James Hall
Simon David Field
Original Assignee
SMR Patents S.à.r.l.
University Of South Australia
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from AU2012900267A external-priority patent/AU2012900267A0/en
Application filed by SMR Patents S.à.r.l., University Of South Australia filed Critical SMR Patents S.à.r.l.
Priority to US14/374,376 priority Critical patent/US9181616B2/en
Priority to JP2014553579A priority patent/JP6251189B2/en
Priority to CN201380012348.6A priority patent/CN104302803B/en
Priority to EP13740802.7A priority patent/EP2807284B1/en
Publication of WO2013110122A1 publication Critical patent/WO2013110122A1/en
Priority to US14/936,024 priority patent/US9656601B2/en
Priority to US15/439,188 priority patent/US10703281B2/en
Priority to US15/589,043 priority patent/US10508788B2/en
Priority to US15/607,894 priority patent/US10744947B2/en
Priority to US15/800,413 priority patent/US20180126910A1/en
Priority to US15/922,366 priority patent/US10661714B2/en
Priority to US15/956,091 priority patent/US10479266B2/en
Priority to US16/001,423 priority patent/US10894507B1/en
Priority to US16/757,834 priority patent/US11273764B2/en
Priority to US16/569,270 priority patent/US10766423B2/en
Priority to US16/572,061 priority patent/US10969080B2/en
Priority to US16/590,891 priority patent/US11519585B2/en
Priority to US16/801,703 priority patent/US11220217B2/en
Priority to US16/993,635 priority patent/US11273766B2/en
Priority to US17/212,121 priority patent/US20210213882A1/en
Priority to US17/401,976 priority patent/US20210370835A1/en
Priority to US17/587,931 priority patent/US20220176878A1/en
Priority to US17/680,658 priority patent/US20220176880A1/en
Priority to US17/939,264 priority patent/US11890989B2/en
Priority to US18/166,749 priority patent/US11878629B2/en
Priority to US18/485,365 priority patent/US20240042935A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B60VEHICLES IN GENERAL
    • B60RVEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR
    • B60R1/00Optical viewing arrangements; Real-time viewing arrangements for drivers or passengers using optical image capturing systems, e.g. cameras or video systems specially adapted for use in or on vehicles
    • B60R1/02Rear-view mirror arrangements
    • B60R1/08Rear-view mirror arrangements involving special optical features, e.g. avoiding blind spots, e.g. convex mirrors; Side-by-side associations of rear-view and other mirrors
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B60VEHICLES IN GENERAL
    • B60QARRANGEMENT OF SIGNALLING OR LIGHTING DEVICES, THE MOUNTING OR SUPPORTING THEREOF OR CIRCUITS THEREFOR, FOR VEHICLES IN GENERAL
    • B60Q1/00Arrangement of optical signalling or lighting devices, the mounting or supporting thereof or circuits therefor
    • B60Q1/26Arrangement of optical signalling or lighting devices, the mounting or supporting thereof or circuits therefor the devices being primarily intended to indicate the vehicle, or parts thereof, or to give signals, to other traffic
    • B60Q1/2661Arrangement of optical signalling or lighting devices, the mounting or supporting thereof or circuits therefor the devices being primarily intended to indicate the vehicle, or parts thereof, or to give signals, to other traffic mounted on parts having other functions
    • B60Q1/2665Arrangement of optical signalling or lighting devices, the mounting or supporting thereof or circuits therefor the devices being primarily intended to indicate the vehicle, or parts thereof, or to give signals, to other traffic mounted on parts having other functions on rear-view mirrors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B60VEHICLES IN GENERAL
    • B60QARRANGEMENT OF SIGNALLING OR LIGHTING DEVICES, THE MOUNTING OR SUPPORTING THEREOF OR CIRCUITS THEREFOR, FOR VEHICLES IN GENERAL
    • B60Q1/00Arrangement of optical signalling or lighting devices, the mounting or supporting thereof or circuits therefor
    • B60Q1/26Arrangement of optical signalling or lighting devices, the mounting or supporting thereof or circuits therefor the devices being primarily intended to indicate the vehicle, or parts thereof, or to give signals, to other traffic
    • B60Q1/34Arrangement of optical signalling or lighting devices, the mounting or supporting thereof or circuits therefor the devices being primarily intended to indicate the vehicle, or parts thereof, or to give signals, to other traffic for indicating change of drive direction
    • B60Q1/38Arrangement of optical signalling or lighting devices, the mounting or supporting thereof or circuits therefor the devices being primarily intended to indicate the vehicle, or parts thereof, or to give signals, to other traffic for indicating change of drive direction using immovably-mounted light sources, e.g. fixed flashing lamps
    • B60Q1/381Arrangement of optical signalling or lighting devices, the mounting or supporting thereof or circuits therefor the devices being primarily intended to indicate the vehicle, or parts thereof, or to give signals, to other traffic for indicating change of drive direction using immovably-mounted light sources, e.g. fixed flashing lamps with several light sources activated in sequence, e.g. to create a sweep effect
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B60VEHICLES IN GENERAL
    • B60RVEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR
    • B60R1/00Optical viewing arrangements; Real-time viewing arrangements for drivers or passengers using optical image capturing systems, e.g. cameras or video systems specially adapted for use in or on vehicles
    • B60R1/02Rear-view mirror arrangements
    • B60R1/06Rear-view mirror arrangements mounted on vehicle exterior
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B60VEHICLES IN GENERAL
    • B60RVEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR
    • B60R1/00Optical viewing arrangements; Real-time viewing arrangements for drivers or passengers using optical image capturing systems, e.g. cameras or video systems specially adapted for use in or on vehicles
    • B60R1/12Mirror assemblies combined with other articles, e.g. clocks
    • B60R1/1207Mirror assemblies combined with other articles, e.g. clocks with lamps; with turn indicators
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
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    • C08J7/0423Coating with two or more layers, where at least one layer of a composition contains a polymer binder with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C27/00Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/06Alloys based on chromium
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    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • C23C14/10Glass or silica
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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    • C23C28/321Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12556Organic component
    • Y10T428/12569Synthetic resin
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12806Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826Group VIB metal-base component
    • Y10T428/12847Cr-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264Up to 3 mils
    • Y10T428/2651 mil or less

Definitions

  • the present invention relates to reflective coatings, particularly chromium-based coatings, for polymeric substrates, being coatings that are able to provide good abrasion resistance with a neutral colour.
  • the present invention relates both to the coatings themselves and also to a method for applying the coatings to polymeric substrates.
  • Polymeric materials have many advantages in both commercial and industrial applications compared to traditional materials such as glass. Typically they afford their user design freedom and advantageous properties such as decreased weight and reduced cost of production.
  • An interesting area of application for the surface engineering of polymeric substrates is the design of ultrathin coatings for use in 'everyday' environments, such as easy-clean coatings on smart phones to mirrors and decorative (colourful) coatings in the automotive industry. Prolonged exposure to these 'everyday' environmental conditions requires such ultrathin coatings to possess a level of robustness against factors such as acidic or caustic environments, temperature variations from as low as -80 °C to highs of +80 °C, variations in relative humidity, as well as abrasive conditions inflicted by everyday wear and tear.
  • the coating in almost all applications employing such coatings, there is a need for the coating to maintain its integrity over extended periods of operation under varying environmental conditions. That is, the coating should not significantly change reflectivity or colour within this time, nor should it delaminate or break away from the underlying substrate.
  • the present invention provides a chromium-based reflective coating for a polymeric substrate, wherein the coating has a thickness of 200nm or less and is an alloy of chromium and a dopant material, the dopant material being selected from the hexagonally close-packed transition metals, the alloy having a crystal structure of a primary body-centered cubic phase in coexistence with a secondary omega hexagonally close-packed phase.
  • the alloy is a binary alloy of chromium and the dopant material.
  • the present invention also provides a method of forming a chromium-based reflective coating on a polymeric substrate, the method including applying chromium and a dopant material to the polymeric substrate by physical vapour deposition, the dopant material being selected from the hexagonally close- packed transition metals, to form an alloy coating having a thickness of 200nm or less, the alloy coating being applied so as to have a crystal structure of a primary body-centered cubic phase in coexistence with a secondary omega hexagonally close-packed phase.
  • the alloy is applied so as to be a binary alloy of chromium and the dopant material.
  • Chromium is a Group 6 member of the transition metals and has a body-centred cubic (bcc) crystal structure.
  • chromium is used primarily for its contribution towards producing a shiny, hard surface that is resistant to corrosion, thus bringing to the alloy the desirable property of optical reflectivity, preferably with an R% greater than 50% so as to find acceptable use in forming a mirror. It has a high melting point, a stable crystalline structure and moderate thermal expansion, making it an ideal primary component for use in the harsh environmental conditions described above.
  • the secondary component of the preferred binary alloy is the dopant material mentioned above, the dopant material herein often being referred to as M and being selected from the hexagonally close-packed (hep) transition metals.
  • the hep structure is the most common among the transition metals, including the transition metals zirconium (Zr), titanium (Ti), cobalt (Co), hafnium (Hf), rubidium (Ru), yttrium (Y), and osmium (Os).
  • Zr zirconium
  • Ti titanium
  • Co cobalt
  • Hf hafnium
  • Ru rubidium
  • Y yttrium
  • Os osmium
  • some of these hep transition metals, such as Zr, Ti and Co are practically easier materials to work with and so will be preferred dopant materials for the purposes of the present invention.
  • Zr will be the most preferred hep dopant material, and thus the present invention will be described herein mainly with reference to Zr as the hep dopant material, this should not be regarded as a limitation on the scope of the present invention.
  • the alloy will be a binary alloy and the atomic percentage of the dopant material in the binary alloy will be in the range of from about 1 .9 at.% to about 5.8 at.%. However, within this broad range, there may be narrower ranges that relate to specific dopant materials, as will be described further below.
  • a hep dopant material to the chromium (a bee transition metal) can yield a range of alloy compositions having an intermetallic crystal structure that has bec and omega- hep phases coexisting, which has been found to provide those alloys with further advantageous properties (beyond those of chromium alone).
  • the careful selection of the amount of hep dopant material relative to the amount of chromium can give rise to alloy compositions within those ranges that are particularly preferred, where desirable properties (such as abrasion resistance) are maximised and undesirable properties (such as a colour other than a neutral colour) are minimised.
  • coatings according to the present invention change in phase composition as the elemental composition of the dopant material is increased, from bcc only, to bcc plus omega-hep, to bcc plus an amorphous phase.
  • the optical and mechanical properties observed for the coatings show variation commensurate with these changes in composition, with the preferred optical and mechanical properties occurring when the phase composition is bcc plus omega-hep. Without wishing to be bound by theory, it is believed that the observed changes are due to the changing electron structure of the atoms and the crystallographic conformation relative to each other.
  • the crystal structure of the coatings demonstrated d-orbital transitions which gave rise to neutral colour and relatively lower reflectivity, with the well-ordered crystal structure yielding higher relative resistance to abrasion.
  • the amorphous phase was present, the d-orbital transitions were no longer observed, indicating that the orbital hybridization between neighbouring atoms was partially filling the d-orbitals, correlating with a less-preferred lower reflectivity.
  • the lower atomic packing density in such an amorphous phase was found to yield coatings with reduced resistance to abrasion, which of course is also less desirable.
  • this transition of phase from bcc plus omega-hep, to bcc plus an amorphous phase was found to occur at values of x of about 0.06, correlating to about 5.8 at.%, when the dopant material was Zr.
  • the same transition is expected to occur at about the same value of x also for Ti and Co.
  • the colour of the coatings of the present invention was found to not show a change in trend at the transition of the phase from bcc plus omega-hep, to bcc plus an amorphous phase.
  • the omega-hep phase is understood to be a displacive phase transformation from the bcc structure.
  • the alloy will be a binary alloy and the dopant material will be Zr, wherein the atomic percentage of the dopant material in the binary alloy will be in the range of from about 4.5 at.% to about 5.8 at.%.
  • the alloy will be a binary alloy and the dopant material will be Co, wherein the atomic percentage of the dopant material in the binary alloy will be in the range of from about 1 .9 at.% to about 5.7 at.%.
  • the behaviour of the other hep transition metals as the dopant material in the present invention can be reasonably expected to be the same or similar to that as seen with Zr, Co and Ti.
  • Ti, Hf, Ru, Y and Os will display the same structure forming abilities in the Cr based alloy of the present invention when their concentration is within the range of about 1 .9 at.% to about 5.8 at.%.
  • the coatings of the present invention are preferably ultrathin coatings, which is being defined in this specification to be a coating with a thickness of 200nm or less. It is envisaged that preferred thicknesses will be in the range of 100nm or less, or more preferably in the range of 40 nm to 80 nm, or more preferably in the narrower range of 50 nm to 70 nm. Ideally, the thickness will be about 60 nm.
  • the polymeric substrate is formed by injection compression moulding, although any other method known in the art, such as compression moulding, blow moulding, reaction moulding and sheet casting, could also be utilised and thus also falls within the scope of the present invention.
  • the polymeric substrate may be any known type of polymeric substrate material and for example could be a substrate formed from a material selected from the group including polyacrylate, polyester, polystyrene, polyethylene, polypropylene, polyamides, polylmides, polycarbonate, epoxy, phenolic, acrylonitrile-butadiene-styrene, acrylonitrile-styrene-arylates, acetal and blends of these.
  • Preferred substrate materials include polycarbonate, poly (2,2'- dihydroxyphenylpropane) carbonate, polydiethyleneglycol bis(allyl carbonate), polymethylmethacrylate and polystyrene, or blends thereof.
  • the polymeric substrate may consist of a polymeric substrate material which has been pre-coated with appropriate films, these films providing the substrate with suitable properties for the deposition and adhesion of the coating of the present invention.
  • the pre-coated films include hardcoats (such as organo-silicon, an acrylic, a urethane, a melamine or an amorphous SiO x CyH z ), inorganic oxides (silica, titania, alumina), thin metal films (Cr, etc), where the pre-coated substrate has been prepared to have the desirable surface energy, residual stress, thermal coefficient of expansion, conductivity, chemical functionality, etc, as required by the specific application of such a Cr based alloy coating.
  • an overcoating may be applied over the coating of the present invention, which overcoating could include transparent coatings for the purposes of mechanical strength, wettability, optical interference filters, modified coefficient of friction, etc.
  • overcoating function are hydrophobic/hydrophilic materials (silica, fluoropolymers), hardcoats, and inorganic oxides (silica).
  • the physical vapour deposition techniques adopted in the method of the present invention will be based upon magnetron sputtering, be it from a primary alloy target or using a co-sputtering process involving two targets made from the respective components of the alloy.
  • the preferred alloy could be deposited using thermal evaporation or e-beam evaporation of the respective alloy components.
  • conventional temperature processing could not be employed to modify the properties of alloy coatings of the type of the present invention.
  • the inventors have determined that the preferred alloys change in phase composition as the elemental composition of a dopant material (such as Zr, Ti or Co) is increased; from bcc only, to bcc plus ⁇ - hcp, to bcc plus an amorphous phase.
  • the optical and mechanical properties for these preferred alloys show variation commensurate with the composition and observed changes relate to the changing electron structure of the atoms and the crystallographic conformation relative to each other.
  • these crystalline ultrathin coatings demonstrate d-orbital transitions that give rise to neutral colour and relatively lower reflectivity, with a well ordered crystal structure yielding higher relative resistance to abrasion.
  • the d-orbital transitions are no longer observed, indicating the partial filling of the d-orbitals. It is believed that the orbital hybridization between neighbouring atoms partially fills the d-orbitals, correlating with a yellow colour and higher reflectivity.
  • the lower atomic packing density in the amorphous phase yielded coatings with reduced resistance to abrasion.
  • Figure 1 shows the phase composition of a CrZr x coating as a function of its elemental composition - the presence of the ⁇ -hcp is represented by the diffraction highlighted with the arrows;
  • Figure 2 shows the photopic reflectivity of a CrZr x coating as a function of the elemental composition - the optical reflectivity of the coating follows its phase composition;
  • Figure 3 shows the reflected chroma of the thin film coating as a function of the elemental composition of a CrZr x coating - chroma embodies the magnitude of the colour relative to neutral, but not the specific colour observed; the transitions between phases are not likely to be discrete at a given concentration;
  • Figure 4 shows the abrasion resistance of a CrZr x coating as a function of the elemental composition of the CrZr x coating
  • Figure 6 shows the relationship between lattice parameter and abrasion resistance across the chromium based samples prepared for the examples.
  • the polymeric substrate was dip-coated at a withdrawal speed of 1 1 mm/s, or spin-coated at 300 revolutions per minute (rpm) for 5 seconds, and cured as per the manufacturers prescribed conditions, to thereby form the hardcoat resin layer upon the polymeric substrate.
  • a custom-built reactor was used to sputter a high purity Si target in an Ar+O 2 environment.
  • the hardcoat resin layer and the S1O2 layer had thicknesses of 5 ⁇ and 140 nm respectively, as determined using a F20 Thin Film Analyzer by Filmetrics Inc.
  • M the hep transition metals Zr and Co
  • the substrates were heated to 85 °C using an infrared lamp in the custom-built reactor as the chamber was evacuated to approximately 1 x10 "4 mbar.
  • a co- sputtering process employing two sputter targets was used to deposit the CrM x alloy layer.
  • the substrate holder was rotated at 60 rpm through the respective plasma's generated from a 5"x12" rectangular high purity Cr target and a 3" disc dopant material target.
  • a sample rotation speed of 60rpm was chosen because each pass through the plasma was calculated to deposit approximately 4 to 6 Angstrom of combined material from the targets, thus avoiding a sandwich type layer structure and achieving the preferred binary alloy coating.
  • a working gas of Ar was introduced at flow rates of 80 standard cubic centimetres per minute (seem).
  • the Cr target was set at a constant power of 1 kW, while the dopant material target was set within the range of 25 to 100 W to define the experimental window for neutral coloured abrasion resistant alloy coatings.
  • the final reflective coating for the samples had a CrM x film thickness in the order of 40 to 60 nm as determined by Atomic Force Microscopy imaging.
  • the Cr:M ratios within the coatings of the samples were generated by changing the dopant material (M) deposition rate relative to the Cr, with the actual ratios achieved determined using X-ray Photoelectron Spectroscopy (XPS) analysis (Kratos Axis Ultra DLD with an ⁇ - ⁇ monochromatic source).
  • XPS X-ray Photoelectron Spectroscopy
  • the elemental composition, defined by x, of the ultrathin CrM x films was determined for each of the samples - see Table 1 (for Zr) and Table 2 (for Co) below for the collected data.
  • Zr used as the dopant material M
  • the electron diffraction pattern was collected using TEM (see Figure 1 ), and then analysed with respect to the major constituents within the film. The spot size of the electron beam was minimised to produce the clearest diffraction patterns possible for these polycrystalline ultrathin films (polycrystalline with respect to the small grain-like/columnar structures that constitute the film).
  • the loss of the maxima and minima in the reflectivity correlates with the transition from the purely crystalline alloy films (bcc and bcc + ⁇ -hcp) to the crystalline plus amorphous. It is believed that in the amorphous phase the higher concentration of Zr yielded partially filled d-orbital bands of the CrZr x structure through orbital hybridization. Increased filling of the orbitals removed the d-orbital interband transitions because they were then occupied. The electron transitions that occured in the electronic structure of the atoms then occured at energies outside of the visible spectrum (>3.5eV).
  • the chroma of the ultrathin film did not show a change in trend at the transition concentration between crystalline to crystalline plus amorphous - see Figure 3.
  • the abrasion resistance of the reflective coating of each sample was determined by employing the Bayer abrasion test. This test is employed in a variety of different industries to qualify the abrasion resistance of a coating, with the variant employed here being similar to the ASTM F735 standard for the determination of abrasion resistance of aircraft windows and ophthalmic lenses.
  • a Taber Oscillating Abrasion Tester (model 6100) was used to subject the samples to 300 cycles (150 cycles/min) over a stroke length of 100mm under an applied load of 0.5 kg of Alundum chips (Norton Company of Worcester MA, USA).
  • the abrasion resistance is quantified by the Bayer Ratio that takes account of the change in haze (or reflection haze for reflective substrates) of the sample from the abrasion, normalised against the change in haze observed for a reference sample (as per SAE J964).
  • Haze is determined by:
  • Haze (R% SE / R%si) x100, where R% S E and R% S i are the reflectivity with the specular beam excluded and included respectively.
  • the abrasion resistance is compared to the Bayer Ratio for a chrome nitride (CrN) coating using the same pre-coated substrate, where the abrasion resistance of the CrN coating is defined as the acceptable level of abrasion resistance, and the acceptable level of abrasion resistance for embodiments of the present invention are then represented as an abrasion resistance (%) of 100%.
  • CrN chrome nitride
  • the mechanical properties of the ultrathin CrZr x films were characterised by measurement of abrasion resistance. Importantly, it was recognised that the resistance to abrasion is not solely characterised by a Cr:Zr ratio, but also by the underlying layers in a multilayer structure. Therefore, in this experimental work, the specially prepared substrates were constant within a given sample, and hence relative variations in the mechanical properties could be assigned to changes in the ultrathin CrZr x coatings.
  • the abrasion ratio determined by the Bayer abrasion test mentioned above is shown in Table 1 and Figures 4 and 6 for Zr as the dopant material, and in Table 2 and Figure 6 for Co as the dopant material.
  • the bcc transition metal Mo was used as the dopant.
  • Table 1 shows that there was an increase in the resistance to abrasion upon increasing the elemental composition of Zr. A maximum in the resistance to abrasion was observed immediately after the transition from bcc to the bcc + ⁇ - hcp, after which increasing the Zr concentration lead to a steady decrease in the measured abrasion ratio.
  • Table 2 shows that the resistance to abrasion increased in line with the increase in elemental composition of Co, with the maximum abrasion resistance achieved prior to the transition from bcc + ⁇ -hcp to bcc + amorphous structure. For both of the dopants exemplified in Tables 1 and 2, the resistance to abrasion was greatest when the dopant was present at concentrations that resulted in a bcc + ⁇ -hcp structure (grey columns).
  • the co-sputtering generates thin film coatings of Cr doped with another metal (Zr in the case of most of what is described here, but alternatively also Ti or Co, or less preferably Hf, Ru, Y and Os).
  • dopant materials such as these modify the structure of the Cr based coating by replacing Cr atoms within the bcc crystal lattice.
  • This modification of the atomic structure of the bcc Cr coating was observed and quantified for the preferred Zr dopant material by measuring the lattice parameter of the crystal structure using electron diffraction.
  • the incorporation of dopant and the resulting change in lattice parameter was observed to correlate with the macroscopic abrasion resistance.
  • the degree of modification of the bcc Cr crystal lattice could be controlled.
  • the diffraction pattern from each sample was analysed in order to determine the lattice parameter, a 0 , in the case of crystalline coatings or simply to confirm an amorphous structure when no crystalline material is observed.
  • the experimental window for the dopant target power was chosen based on the overall maximum Bayer Ratio achieved for each dopant material. This window was in the range of 50 to 100 W.
  • the dominant phase present for the solid solutions of these samples was found to be the bcc structure, however for certain samples additional phases were observed.
  • the diffraction spectra of CrCo x , CrZr x and CrTi x showed the presence of a secondary phase different from bcc as indicated by the arrows in Figure 5.
  • This secondary phase was identified as a ⁇ -hcp phase, a displacive phase transformation from the bcc phase.
  • amorphous material is present in the background of the diffraction patterns, with this phase being most noticeable for the CrTi x alloy (the blurred background in the CrTi x diffraction image in Figure 5).
  • Th e relationship between the atomic structure and the macroscopic abrasion resistance is evident in Tables 1 , 2. Additionally, and as can be seen in Figure 6, across the Cr based alloys of the samples, there is a clear trend that as the lattice parameter decreases the abrasion resistance increases. This increase in abrasion resistance is primarily attributed to the increase in packing density of the atoms.
  • a comparison of the valence electrons for Cr (4s 1 and 3d 5 ) with the preferred dopant materials of the present invention shows that Mo is comparable (5s 1 and 4d 5 ), while the others have additional s-orbital and differing number of d-orbital valence electrons.
  • the dopant materials with a differing number of valence electrons compared to Cr yielded a decrease in the lattice parameter in the alloy, while Mo (which is not one of the preferred hep transition metals ideal for use as the dopant material) yielded an increase.
  • the orbital overlap for the dopant materials with additional valence electrons increases the bonding strength in the alloy, thus yielding a reduced lattice parameter.
  • the bec structure of the as-deposited Cr has been modified to a level by the dopant material where the abrasion resistance rivals that of an as-deposited fee CrN coating (Bayer Abrasion Ratio ⁇ 7 for an as-deposited CrNi .3 coating using the custom-built reactor on the specially prepared substrates).
  • the preferred dopant materials utilised in this experimental work are also able to be categorised by their room temperature equilibrium structures. Mo and W are bcc at room temperature, while Ti, Co and Zr are hep at room temperature.
  • the hep dopant materials achieve a greater reduction in lattice parameter than the bcc dopant materials. Given the observation of the electron structure of the dopant material influencing the bonding strength, it is believed that the hep dopant material's electronic structure yields higher bond strengths. In addition, and as mentioned above, these hep dopant materials yield the preferred composite film having both the bcc and the ⁇ -hcp phase.

Abstract

A chromium-based reflective coating for a polymeric substrate, wherein the coating has a thickness of 200nm or less and is an alloy of chromium and a dopant material, the dopant material being selected from the hexagonally close- packed transition metals, the alloy having a crystal structure of a primary body- centered cubic phase in coexistence with a secondary omega hexagonally close-packed phase.

Description

CHROMIUM-BASED REFLECTIVE COATING
This application claims priority from Australian provisional patent application 2012900267 filed on 24 January 2012, the contents of which are to be taken as incorporated herein by this reference.
Field of the Invention
The present invention relates to reflective coatings, particularly chromium-based coatings, for polymeric substrates, being coatings that are able to provide good abrasion resistance with a neutral colour. The present invention relates both to the coatings themselves and also to a method for applying the coatings to polymeric substrates. Background of the Invention
Polymeric materials have many advantages in both commercial and industrial applications compared to traditional materials such as glass. Typically they afford their user design freedom and advantageous properties such as decreased weight and reduced cost of production. An interesting area of application for the surface engineering of polymeric substrates is the design of ultrathin coatings for use in 'everyday' environments, such as easy-clean coatings on smart phones to mirrors and decorative (colourful) coatings in the automotive industry. Prolonged exposure to these 'everyday' environmental conditions requires such ultrathin coatings to possess a level of robustness against factors such as acidic or caustic environments, temperature variations from as low as -80 °C to highs of +80 °C, variations in relative humidity, as well as abrasive conditions inflicted by everyday wear and tear. Additionally, in almost all applications employing such coatings, there is a need for the coating to maintain its integrity over extended periods of operation under varying environmental conditions. That is, the coating should not significantly change reflectivity or colour within this time, nor should it delaminate or break away from the underlying substrate.
However, the application of appropriate coatings to polymeric materials is particularly difficult given that traditional coating methods generally require substrates that can withstand high temperatures (often >150°C). As most common polymeric materials have relatively low softening temperatures, there is a paucity of appropriate coatings for these substrates. To date the majority of work on the development of robust abrasion-resistant ultrathin coatings has thus focussed on the deposition of hard compounds such as borides, carbides and nitrides to hard/heat-resistant substrates such as metal and ceramics. However, the high temperatures used in the deposition techniques are inappropriate for use on polymeric substrates. Therefore, there is a need for ultrathin coatings that can be applied to polymeric substrates with relatively low softening temperatures, which are still capable of delivering desired physical properties such as abrasion resistance, reflectivity (preferably with a R% greater than 50%) and neutral (or a desired) colour. With specific regard to colour, reference throughout this specification to a "neutral" colour is reference to a colour that is defined by measured L*, a* and b* values in accordance with the 1976 CIE L*a*b* Space (or CIELAB) colour model, which is an approximately uniform colour scale organised in cube form. In the orthogonal a* and b* colour axes, positive a* values are red, negative a* values are green, positive b* values are yellow and negative b* values are blue, while the vertical scale for lightness (or greyscale) L* runs from 0 (black) to 100 (white), allowing the positioning of a total colour E in three points. The Chroma (C*) of the colour is defined as v(a*2 + b*2), and is used to quantify the magnitude of the colour independent of its lightness. Ideally, for the colour E to be neutral, the C* value will be less than or equal to 1 and the colour E will thus be close to the neutral L* axis. The above discussion of background is included to explain the context of the present invention. It is not to be taken as an admission that any of the material referred to was published, known or part of the common general knowledge at the priority date of any one of the claims.
Summary of the Invention
The present invention provides a chromium-based reflective coating for a polymeric substrate, wherein the coating has a thickness of 200nm or less and is an alloy of chromium and a dopant material, the dopant material being selected from the hexagonally close-packed transition metals, the alloy having a crystal structure of a primary body-centered cubic phase in coexistence with a secondary omega hexagonally close-packed phase. In a preferred form of the present invention, the alloy is a binary alloy of chromium and the dopant material.
The present invention also provides a method of forming a chromium-based reflective coating on a polymeric substrate, the method including applying chromium and a dopant material to the polymeric substrate by physical vapour deposition, the dopant material being selected from the hexagonally close- packed transition metals, to form an alloy coating having a thickness of 200nm or less, the alloy coating being applied so as to have a crystal structure of a primary body-centered cubic phase in coexistence with a secondary omega hexagonally close-packed phase. In a preferred form of the present invention, the alloy is applied so as to be a binary alloy of chromium and the dopant material.
Chromium is a Group 6 member of the transition metals and has a body-centred cubic (bcc) crystal structure. Incorporated as the primary component in the preferred binary alloy of the present invention, being an alloy of two principal metallic components, chromium is used primarily for its contribution towards producing a shiny, hard surface that is resistant to corrosion, thus bringing to the alloy the desirable property of optical reflectivity, preferably with an R% greater than 50% so as to find acceptable use in forming a mirror. It has a high melting point, a stable crystalline structure and moderate thermal expansion, making it an ideal primary component for use in the harsh environmental conditions described above.
The secondary component of the preferred binary alloy is the dopant material mentioned above, the dopant material herein often being referred to as M and being selected from the hexagonally close-packed (hep) transition metals. The hep structure is the most common among the transition metals, including the transition metals zirconium (Zr), titanium (Ti), cobalt (Co), hafnium (Hf), rubidium (Ru), yttrium (Y), and osmium (Os). In this respect, some of these hep transition metals, such as Zr, Ti and Co are practically easier materials to work with and so will be preferred dopant materials for the purposes of the present invention.
While it is envisaged that Zr will be the most preferred hep dopant material, and thus the present invention will be described herein mainly with reference to Zr as the hep dopant material, this should not be regarded as a limitation on the scope of the present invention.
In a preferred form of the present invention, the alloy will be a binary alloy and the atomic percentage of the dopant material in the binary alloy will be in the range of from about 1 .9 at.% to about 5.8 at.%. However, within this broad range, there may be narrower ranges that relate to specific dopant materials, as will be described further below.
It has been found that the introduction of small amounts of a hep dopant material to the chromium (a bee transition metal) can yield a range of alloy compositions having an intermetallic crystal structure that has bec and omega- hep phases coexisting, which has been found to provide those alloys with further advantageous properties (beyond those of chromium alone). Indeed, it has been found that the careful selection of the amount of hep dopant material relative to the amount of chromium can give rise to alloy compositions within those ranges that are particularly preferred, where desirable properties (such as abrasion resistance) are maximised and undesirable properties (such as a colour other than a neutral colour) are minimised.
By way of explanation, it has been found that coatings according to the present invention change in phase composition as the elemental composition of the dopant material is increased, from bcc only, to bcc plus omega-hep, to bcc plus an amorphous phase. The optical and mechanical properties observed for the coatings show variation commensurate with these changes in composition, with the preferred optical and mechanical properties occurring when the phase composition is bcc plus omega-hep. Without wishing to be bound by theory, it is believed that the observed changes are due to the changing electron structure of the atoms and the crystallographic conformation relative to each other.
Specifically, when the phase composition was bcc plus omega-hep, the crystal structure of the coatings demonstrated d-orbital transitions which gave rise to neutral colour and relatively lower reflectivity, with the well-ordered crystal structure yielding higher relative resistance to abrasion. By way of comparison, when the amorphous phase was present, the d-orbital transitions were no longer observed, indicating that the orbital hybridization between neighbouring atoms was partially filling the d-orbitals, correlating with a less-preferred lower reflectivity. Furthermore, the lower atomic packing density in such an amorphous phase was found to yield coatings with reduced resistance to abrasion, which of course is also less desirable.
With this in mind, and referring to the dopant material as M in the general formula CrMx, this transition of phase from bcc plus omega-hep, to bcc plus an amorphous phase, was found to occur at values of x of about 0.06, correlating to about 5.8 at.%, when the dopant material was Zr. The same transition is expected to occur at about the same value of x also for Ti and Co. Unlike the reflectivity, the colour of the coatings of the present invention was found to not show a change in trend at the transition of the phase from bcc plus omega-hep, to bcc plus an amorphous phase. To the contrary, at the transition of the phase from bcc to bcc plus omega-hep, which was found to occur for Zr at values of x (in the above general formula) of about 0.05 (correlating to a lower limit of about 4.5 at.%), a transition in the colour of the coatings of the present invention was found. This suggests the onset of the orbital hybridization in the electron structure occurs at concentrations of Zr as the dopant material close to about 4.5 at.%. However, the same transition point for Co as the dopant material was found to be about 1 .9 at.%.
By way of explanation, and again using Zr as the exemplary hep dopant material, at low concentrations there is an increase in the resistance to abrasion upon increasing the elemental composition of Zr. A maximum in the resistance to abrasion is observed at the transition from bcc to the bcc plus omega-hep, after which increasing the Zr concentration leads to a steady decrease in the measured abrasion ratio. Indeed, from an electron diffraction analysis of CrZrx coatings, two transition concentrations are defined that represent the change from one phase composition to another. For Zr as the dopant material, these transitions are at about x = 0.05 (bcc to bcc + Ω-hcp) and about 0.06 (bcc + Ω- hep to bcc + amorphous). In this respect, the omega-hep phase is understood to be a displacive phase transformation from the bcc structure.
Accordingly, in one form of the present invention, the alloy will be a binary alloy and the dopant material will be Zr, wherein the atomic percentage of the dopant material in the binary alloy will be in the range of from about 4.5 at.% to about 5.8 at.%.
In yet another form of the present invention, the alloy will be a binary alloy and the dopant material will be Co, wherein the atomic percentage of the dopant material in the binary alloy will be in the range of from about 1 .9 at.% to about 5.7 at.%. In relation to predictive conclusions able to be drawn by the inventors (based on the similarity in the physical nature of all hep transition metals) from the experimental work (described below) conducted in relation to Zr and Co, and to an extent Ti, it will be appreciated by a skilled addressee that the behaviour of the other hep transition metals as the dopant material in the present invention can be reasonably expected to be the same or similar to that as seen with Zr, Co and Ti. Indeed, the comparative experimental work conducted (again, see below) on the bec transition metal molybdenum (Mo), where similar behaviour was not expected (and was not seen) due to the different physical nature of this transition metal, also tends to confirm these predictive conclusions about the hep transition metals.
Indeed, given that the physical nature of the other hep transition metals is similar to both Zr and Co, it is expected that Ti, Hf, Ru, Y and Os will display the same structure forming abilities in the Cr based alloy of the present invention when their concentration is within the range of about 1 .9 at.% to about 5.8 at.%.
The coatings of the present invention are preferably ultrathin coatings, which is being defined in this specification to be a coating with a thickness of 200nm or less. It is envisaged that preferred thicknesses will be in the range of 100nm or less, or more preferably in the range of 40 nm to 80 nm, or more preferably in the narrower range of 50 nm to 70 nm. Ideally, the thickness will be about 60 nm. Preferably, the polymeric substrate is formed by injection compression moulding, although any other method known in the art, such as compression moulding, blow moulding, reaction moulding and sheet casting, could also be utilised and thus also falls within the scope of the present invention. The polymeric substrate may be any known type of polymeric substrate material and for example could be a substrate formed from a material selected from the group including polyacrylate, polyester, polystyrene, polyethylene, polypropylene, polyamides, polylmides, polycarbonate, epoxy, phenolic, acrylonitrile-butadiene-styrene, acrylonitrile-styrene-arylates, acetal and blends of these. Preferred substrate materials include polycarbonate, poly (2,2'- dihydroxyphenylpropane) carbonate, polydiethyleneglycol bis(allyl carbonate), polymethylmethacrylate and polystyrene, or blends thereof.
Additionally, the polymeric substrate may consist of a polymeric substrate material which has been pre-coated with appropriate films, these films providing the substrate with suitable properties for the deposition and adhesion of the coating of the present invention. The pre-coated films include hardcoats (such as organo-silicon, an acrylic, a urethane, a melamine or an amorphous SiOxCyHz), inorganic oxides (silica, titania, alumina), thin metal films (Cr, etc), where the pre-coated substrate has been prepared to have the desirable surface energy, residual stress, thermal coefficient of expansion, conductivity, chemical functionality, etc, as required by the specific application of such a Cr based alloy coating.
In a similar manner, a skilled addressee will understand that an overcoating may be applied over the coating of the present invention, which overcoating could include transparent coatings for the purposes of mechanical strength, wettability, optical interference filters, modified coefficient of friction, etc. Examples of overcoating function are hydrophobic/hydrophilic materials (silica, fluoropolymers), hardcoats, and inorganic oxides (silica). In a preferred form, the physical vapour deposition techniques adopted in the method of the present invention will be based upon magnetron sputtering, be it from a primary alloy target or using a co-sputtering process involving two targets made from the respective components of the alloy. Alternatively, it will be appreciated that the preferred alloy could be deposited using thermal evaporation or e-beam evaporation of the respective alloy components. Before turning to a description of various preferred embodiments of the present invention, it will be appreciated that, due to the nature of polymeric substrates, conventional temperature processing (during or after deposition) could not be employed to modify the properties of alloy coatings of the type of the present invention. In the inventive coatings, the inventors have determined that the preferred alloys change in phase composition as the elemental composition of a dopant material (such as Zr, Ti or Co) is increased; from bcc only, to bcc plus Ω- hcp, to bcc plus an amorphous phase. The optical and mechanical properties for these preferred alloys (as ultrathin coatings) show variation commensurate with the composition and observed changes relate to the changing electron structure of the atoms and the crystallographic conformation relative to each other.
Indeed, these crystalline ultrathin coatings demonstrate d-orbital transitions that give rise to neutral colour and relatively lower reflectivity, with a well ordered crystal structure yielding higher relative resistance to abrasion. When amorphous material is present in the coatings, the d-orbital transitions are no longer observed, indicating the partial filling of the d-orbitals. It is believed that the orbital hybridization between neighbouring atoms partially fills the d-orbitals, correlating with a yellow colour and higher reflectivity. Furthermore, the lower atomic packing density in the amorphous phase yielded coatings with reduced resistance to abrasion.
Description of the Preferred Embodiments
The present invention will now be described in relation to various preferred embodiments of which some aspects are illustrated by the accompanying figures, with other aspects being illustrated by the following examples as summarised in the following tables. In the figures: Figure 1 shows the phase composition of a CrZrx coating as a function of its elemental composition - the presence of the Ω-hcp is represented by the diffraction highlighted with the arrows; Figure 2 shows the photopic reflectivity of a CrZrx coating as a function of the elemental composition - the optical reflectivity of the coating follows its phase composition;
Figure 3 shows the reflected chroma of the thin film coating as a function of the elemental composition of a CrZrx coating - chroma embodies the magnitude of the colour relative to neutral, but not the specific colour observed; the transitions between phases are not likely to be discrete at a given concentration;
Figure 4 shows the abrasion resistance of a CrZrx coating as a function of the elemental composition of the CrZrx coating;
Figure 5 shows diffraction patterns from a Transmission Electron Microscope for CrMx samples in accordance with embodiments of the present invention (M = Zr, Co and Ti) and for comparative purposes (M = W and Mo); and
Figure 6 shows the relationship between lattice parameter and abrasion resistance across the chromium based samples prepared for the examples.
Examples - Physical Properties
Experiments were conducted to form various coatings in accordance with the present invention upon polymeric substrates. In these experiments, specially prepared polymeric substrates were utilised, which themselves included coatings applied directly thereupon. Indeed, the polymeric substrates were a polycarbonate material (approximately 8 cm x 8 cm squares of 0.5 cm thickness) coated with a hardcoat resin (PHC587B from Momentive Performance Materials Inc., TSR2626B from SDC Technologies Inc., or PR660/MP101 from SDC Technologies Inc.), the hardcoat then itself coated with a reactively sputtered S1O2 layer.
The polymeric substrate was dip-coated at a withdrawal speed of 1 1 mm/s, or spin-coated at 300 revolutions per minute (rpm) for 5 seconds, and cured as per the manufacturers prescribed conditions, to thereby form the hardcoat resin layer upon the polymeric substrate. For the S1O2 layer, a custom-built reactor was used to sputter a high purity Si target in an Ar+O2 environment. The hardcoat resin layer and the S1O2 layer had thicknesses of 5 μιτι and 140 nm respectively, as determined using a F20 Thin Film Analyzer by Filmetrics Inc.
The chromium-based reflective coating of the present invention was subsequently applied to the specially prepared polymeric substrates in a custom-built reactor by magnetron co-sputtering a CrMx alloy layer (where M = the hep transition metals Zr and Co), to form a range of exemplified samples. In addition, comparative samples were prepared where M = the bec transition metal molybdenum (Mo).
The substrates were heated to 85 °C using an infrared lamp in the custom-built reactor as the chamber was evacuated to approximately 1 x10"4 mbar. A co- sputtering process employing two sputter targets was used to deposit the CrMx alloy layer. The substrate holder was rotated at 60 rpm through the respective plasma's generated from a 5"x12" rectangular high purity Cr target and a 3" disc dopant material target. A sample rotation speed of 60rpm was chosen because each pass through the plasma was calculated to deposit approximately 4 to 6 Angstrom of combined material from the targets, thus avoiding a sandwich type layer structure and achieving the preferred binary alloy coating.
A working gas of Ar was introduced at flow rates of 80 standard cubic centimetres per minute (seem). For deposition, the Cr target was set at a constant power of 1 kW, while the dopant material target was set within the range of 25 to 100 W to define the experimental window for neutral coloured abrasion resistant alloy coatings. The final reflective coating for the samples had a CrMx film thickness in the order of 40 to 60 nm as determined by Atomic Force Microscopy imaging. The Cr:M ratios within the coatings of the samples were generated by changing the dopant material (M) deposition rate relative to the Cr, with the actual ratios achieved determined using X-ray Photoelectron Spectroscopy (XPS) analysis (Kratos Axis Ultra DLD with an ΑΙ-Κα monochromatic source).
The elemental composition, defined by x, of the ultrathin CrMx films was determined for each of the samples - see Table 1 (for Zr) and Table 2 (for Co) below for the collected data. With Zr used as the dopant material M, as the ratio between the power density applied to the Zr and Cr targets increased, there was a near linear increase in the Zr concentration in the ultrathin film. For each of the Zr samples the electron diffraction pattern was collected using TEM (see Figure 1 ), and then analysed with respect to the major constituents within the film. The spot size of the electron beam was minimised to produce the clearest diffraction patterns possible for these polycrystalline ultrathin films (polycrystalline with respect to the small grain-like/columnar structures that constitute the film).
From the electron diffraction analysis of the CrZrx films, two transition concentrations are defined that represent the change from one phase composition to another. These transitions are at x = 0.05 (bcc to bcc + Ω-hcp) and 0.06 (bcc + Ω-hcp to bcc + amorphous). The Ω-hcp phase is a displacive phase transformation from the bcc structure.
The optical properties of each sample were determined using a HunterLab UltraScan Pro instrument. These optical measurements were quantified by the CIELAB measures of a* and b* (as mentioned above) which embody the colour or chroma (C* = v(a*2 + b*2)) of the captured light, be it transmitted or reflected. Also, the total photopic reflectivity (R%) of the coatings was measured. With reference to Tables 1 and 2 and Figure 2, the reflectivity was observed to change over the elemental composition range presented. More so, the optical response followed that of the phase composition of the film with observed discontinuities in the reflectivity versus elemental composition at the transition concentrations defined from the electron diffraction assignment.
Further to this change in reflectivity, at lower concentrations of Zr a maxima and minima was observed in the reflectivity as a function of photon energy. Indeed, measurement of the photon energy for the maxima and minima yielded 2.5 and 2.2eV respectively, at concentrations up to CrZrx=o.n . At these energy levels the observed maxima is assigned to electron transitions from the filled d-orbital bands to the empty d-orbital bands of the atoms, namely the 3→5 transition. From the electron diffraction images, the crystal structure in this concentration range was representative of the bcc structure for Cr.
The loss of the maxima and minima in the reflectivity correlates with the transition from the purely crystalline alloy films (bcc and bcc + Ω-hcp) to the crystalline plus amorphous. It is believed that in the amorphous phase the higher concentration of Zr yielded partially filled d-orbital bands of the CrZrx structure through orbital hybridization. Increased filling of the orbitals removed the d-orbital interband transitions because they were then occupied. The electron transitions that occured in the electronic structure of the atoms then occured at energies outside of the visible spectrum (>3.5eV). As the d-orbtial transitions were reduced and eliminated by increasing the Zr concentration, the yellow part of the visible spectrum (ca 2.15eV) increased in reflectivity relative to the other energy regions. Thus, the samples changed in their colour intensity (chroma) from neutral to yellow when the elemental composition of Zr increased, as is apparent from Figure 3.
Indeed, unlike the reflectivity, the chroma of the ultrathin film did not show a change in trend at the transition concentration between crystalline to crystalline plus amorphous - see Figure 3. At the transition concentration (x = 0.05) where the additional Ω-hcp is observed, there is a transition in the C* value of the ultrathin films. This suggests the onset of the orbital hybridization in the electron structure occurs at concentrations of Zr close to x =0.05
The abrasion resistance of the reflective coating of each sample was determined by employing the Bayer abrasion test. This test is employed in a variety of different industries to qualify the abrasion resistance of a coating, with the variant employed here being similar to the ASTM F735 standard for the determination of abrasion resistance of aircraft windows and ophthalmic lenses. A Taber Oscillating Abrasion Tester (model 6100) was used to subject the samples to 300 cycles (150 cycles/min) over a stroke length of 100mm under an applied load of 0.5 kg of Alundum chips (Norton Company of Worcester MA, USA). In this test, the abrasion resistance is quantified by the Bayer Ratio that takes account of the change in haze (or reflection haze for reflective substrates) of the sample from the abrasion, normalised against the change in haze observed for a reference sample (as per SAE J964). Haze is determined by:
Haze = (R%SE / R%si) x100, where R%SE and R%Si are the reflectivity with the specular beam excluded and included respectively.
Both the sample and the reference were tested for haze using the same HunterLab UltraScan Pro instrument used for the colour and reflectivity measurements. In this study, the same type of reference material was used for determination of the Bayer Ratio (a piece of uncoated polycarbonate). The larger the determined Bayer Ratio, the greater the abrasion resistance relative to the reference sample. To reference the performance of the coating of the present invention, in situations where various pre-coating films were present as a part of the polymeric substrate, the abrasion resistance is compared to the Bayer Ratio for a chrome nitride (CrN) coating using the same pre-coated substrate, where the abrasion resistance of the CrN coating is defined as the acceptable level of abrasion resistance, and the acceptable level of abrasion resistance for embodiments of the present invention are then represented as an abrasion resistance (%) of 100%.
Again with particular reference to the samples having Zr as the dopant material M, the mechanical properties of the ultrathin CrZrx films were characterised by measurement of abrasion resistance. Importantly, it was recognised that the resistance to abrasion is not solely characterised by a Cr:Zr ratio, but also by the underlying layers in a multilayer structure. Therefore, in this experimental work, the specially prepared substrates were constant within a given sample, and hence relative variations in the mechanical properties could be assigned to changes in the ultrathin CrZrx coatings. The abrasion ratio determined by the Bayer abrasion test mentioned above is shown in Table 1 and Figures 4 and 6 for Zr as the dopant material, and in Table 2 and Figure 6 for Co as the dopant material. For the purposes of comparative analysis the bcc transition metal Mo was used as the dopant. Table 1 shows that there was an increase in the resistance to abrasion upon increasing the elemental composition of Zr. A maximum in the resistance to abrasion was observed immediately after the transition from bcc to the bcc + Ω- hcp, after which increasing the Zr concentration lead to a steady decrease in the measured abrasion ratio. Table 2 shows that the resistance to abrasion increased in line with the increase in elemental composition of Co, with the maximum abrasion resistance achieved prior to the transition from bcc + Ω-hcp to bcc + amorphous structure. For both of the dopants exemplified in Tables 1 and 2, the resistance to abrasion was greatest when the dopant was present at concentrations that resulted in a bcc + Ω-hcp structure (grey columns).
Figure imgf000018_0001
Table 1
Figure imgf000018_0002
Table 2
Examples - Crystal Structure
The co-sputtering generates thin film coatings of Cr doped with another metal (Zr in the case of most of what is described here, but alternatively also Ti or Co, or less preferably Hf, Ru, Y and Os). As mentioned above, dopant materials such as these modify the structure of the Cr based coating by replacing Cr atoms within the bcc crystal lattice. This modification of the atomic structure of the bcc Cr coating was observed and quantified for the preferred Zr dopant material by measuring the lattice parameter of the crystal structure using electron diffraction. The incorporation of dopant and the resulting change in lattice parameter was observed to correlate with the macroscopic abrasion resistance. Depending on the class of the dopant metal (be it bcc or hep) at room temperature, it was found that the degree of modification of the bcc Cr crystal lattice could be controlled.
An understanding of the atomic structure of the preferred binary alloys formed in the reflective coatings of the present invention was developed by conducting electron diffraction experiments on samples using a Philips CM200 Transmission Electron Microscope (TEM). These samples were prepared by sputtering directly onto NaCI crystals, dissolving away the crystal in Milli-Q water, and then floating the alloy coating onto an uncoated copper TEM grid. The samples included the use of the additional hep transition metal Ti, plus the bcc transition metals Mo and W which were investigated for comparative purposes.
The diffraction pattern from each sample was analysed in order to determine the lattice parameter, a0, in the case of crystalline coatings or simply to confirm an amorphous structure when no crystalline material is observed. The experimental window for the dopant target power was chosen based on the overall maximum Bayer Ratio achieved for each dopant material. This window was in the range of 50 to 100 W. The resulting powers tested for the different alloy mixtures were Mo and W = 100 W; and Co, Ti and Zr = 50 W.
The dominant phase present for the solid solutions of these samples was found to be the bcc structure, however for certain samples additional phases were observed. The diffraction spectra of CrCox, CrZrx and CrTix showed the presence of a secondary phase different from bcc as indicated by the arrows in Figure 5. This secondary phase was identified as a Ω-hcp phase, a displacive phase transformation from the bcc phase. Further to this analysis, it was noted that amorphous material is present in the background of the diffraction patterns, with this phase being most noticeable for the CrTix alloy (the blurred background in the CrTix diffraction image in Figure 5). Th e relationship between the atomic structure and the macroscopic abrasion resistance is evident in Tables 1 , 2. Additionally, and as can be seen in Figure 6, across the Cr based alloys of the samples, there is a clear trend that as the lattice parameter decreases the abrasion resistance increases. This increase in abrasion resistance is primarily attributed to the increase in packing density of the atoms.
Indeed, comparing the atomic radii of the dopant materials to that of Cr highlights that the change in lattice parameter of the CrMx alloys cannot be rationalised based on size constraints on the packing density (for example, W has a larger atomic radius yet a decrease in lattice parameter was observed for an alloy with W as the dopant material). Indeed, for transition metal alloys the electronic state of the atoms being alloyed and their electronic interaction generally play a contributing role in defining the lattice parameter. A comparison of the valence electrons for Cr (4s1 and 3d5) with the preferred dopant materials of the present invention shows that Mo is comparable (5s1 and 4d5), while the others have additional s-orbital and differing number of d-orbital valence electrons. The dopant materials with a differing number of valence electrons compared to Cr yielded a decrease in the lattice parameter in the alloy, while Mo (which is not one of the preferred hep transition metals ideal for use as the dopant material) yielded an increase.
With respect to the mechanical properties of the preferred alloys of the present invention, these results contrast to other situations where the addition of dopant material with a greater number of valence electrons yields solid solution softening when alloyed with the group-VI metals of Mo and W.
While not wishing to be bound by theory, it is believed that the orbital overlap for the dopant materials with additional valence electrons increases the bonding strength in the alloy, thus yielding a reduced lattice parameter. Importantly, the bec structure of the as-deposited Cr has been modified to a level by the dopant material where the abrasion resistance rivals that of an as-deposited fee CrN coating (Bayer Abrasion Ratio ~ 7 for an as-deposited CrNi.3 coating using the custom-built reactor on the specially prepared substrates).
Finally, the preferred dopant materials utilised in this experimental work are also able to be categorised by their room temperature equilibrium structures. Mo and W are bcc at room temperature, while Ti, Co and Zr are hep at room temperature. The hep dopant materials achieve a greater reduction in lattice parameter than the bcc dopant materials. Given the observation of the electron structure of the dopant material influencing the bonding strength, it is believed that the hep dopant material's electronic structure yields higher bond strengths. In addition, and as mentioned above, these hep dopant materials yield the preferred composite film having both the bcc and the Ω-hcp phase.
It will be appreciated that there may be other variations and modifications to the compositions described herein that are also within the scope of the present invention.

Claims

The claims are:
1 . A chromium-based reflective coating for a polymeric substrate, wherein the coating has a thickness of 200nm or less and is an alloy of chromium and a dopant material, the dopant material being selected from the hexagonally close- packed transition metals, the alloy having a crystal structure of a primary body- centered cubic phase in coexistence with a secondary omega hexagonally close-packed phase.
2. A chromium-based reflective coating according to claim 1 , wherein the alloy is a binary alloy of chromium and the dopant material.
3. A chromium-based reflective coating according to claim 1 or claim 2, wherein the atomic percentage of the dopant material in the binary alloy is in the range of from about 1 .9 at.% to about 5.8 at.%.
4. A chromium-based reflective coating according to any one of claims 1 to 3, wherein the dopant material is selected from the hexagonally close-packed transition metals zirconium, titanium, cobalt, hafnium, rubidium, yttrium and osmium.
5. A chromium-based reflective coating according to any one of claims 1 to 3, wherein the dopant material is selected from the hexagonally close-packed transition metals zirconium, titanium and cobalt.
6. A chromium-based reflective coating according to claim 1 , wherein the alloy is a binary alloy and the dopant material is zirconium, and wherein the atomic percentage of the zirconium in the binary alloy is in the range of from about 4.5 at.% to about 5.8 at.%.
7. A chromium-based reflective coating according to claim 1 , wherein the alloy is a binary alloy and the dopant material is titanium, and wherein the atomic percentage of the titanium in the binary alloy is in the range of from about 1 .9 at.% to about 5.8 at.%.
8. A chromium-based reflective coating according to claim 1 , wherein the alloy is a binary alloy and the dopant material is cobalt, and wherein the atomic percentage of the cobalt in the binary alloy is in the range of from about 1 .9 at.% to 5.7 at.%.
9. A chromium-based reflective coating according to any one of claims 1 to 8, wherein the thickness of the coating is 100nm or less.
10. A chromium-based reflective coating according to any one of claims 1 to 8, wherein the thickness of the coating is in the range of from 40nm to 80nm.
1 1 . A chromium-based reflective coating according to any one of claims 1 to 8, wherein the thickness of the coating is in the range of from 50nm to 70nm.
12. A chromium-based reflective coating according to any one of claims 1 to 8, wherein the thickness of the coating is about 60nm.
13. A method of forming a chromium-based reflective coating on a polymeric substrate, the method including applying chromium and a dopant material to the polymeric substrate by physical vapour deposition, the dopant material being selected from the hexagonally close-packed transition metals, to form an alloy coating having a thickness of 200nm or less, the alloy coating being applied so as to have a crystal structure of a primary body-centered cubic phase in coexistence with a secondary omega hexagonally close-packed phase
14. A method according to claim 13, wherein the alloy is a binary alloy of chromium and the dopant material.
15. A method according to claim 13 or claim 14, wherein the atomic percentage of the dopant material in the binary alloy is in the range of from about 1 .9 at.% to about 5.8 at.%.
16. A method according to any one of claims 13 to 15, wherein the dopant material is selected from the hexagonally close-packed transition metals zirconium, titanium, cobalt, hafnium, rubidium, yttrium and osmium.
17. A method according to any one of claims 13 to 15, wherein the dopant material is selected from the hexagonally close-packed transition metals zirconium, titanium and cobalt.
18. A method according to claim 13, wherein the alloy is a binary alloy and the dopant material is zirconium, and wherein the atomic percentage of the zirconium in the binary alloy is in the range of from about 4.5 at.% to about 5.8 at.%.
19. A method according to claim 13, wherein the alloy is a binary alloy and the dopant material is cobalt, and wherein the atomic percentage of the cobalt in the binary alloy is in the range of from about 1 .9 at.% to about 5.7 at.%.
20. A method according to any one of claims 13 to 19, wherein the thickness of the coating is 100nm or less.
21 . A method according to any one of claims 13 to 19, wherein the thickness of the coating is in the range of from 40nm to 80nm.
22. A method according to any one of claims 13 to 19, wherein the thickness of the coating is in the range of from 50nm to 70nm.
23. A method according to any one of claims 13 to 19, wherein the thickness of the coating is about 60nm.
24. A method according to any one of claims 13 to 23, wherein the physical vapour deposition is conducted by magnetron sputtering.
25. A method according to claim 24, wherein the magnetron sputtering utilises a primary alloy target or two alloy targets, each of the two alloy targets being made from one of the chromium or the dopant material.
26. A method according to any one of claims 13 to 23, wherein the physical vapour deposition is conducted by using thermal evaporation or e-beam evaporation.
27. A polymeric substrate coated with a chromium-based reflective coating, the chromium-based reflective coating being in accordance with any one of claims 1 to 12.
28. A coated polymeric substrate according to claim 27, wherein the polymeric substrate is formed from a material selected from the group of polyacrylate, polyester, polystyrene, polyethylene, polypropylene, polyamides, polylmides, polycarbonate, epoxy, phenolic, acrylonitrile-butadiene-styrene, acrylonitrile-styrene-arylates, acetal and blends of these.
29. A coated polymeric substrate according to claim 27, wherein the polymeric substrate is formed from a material selected from the group of polycarbonate, poly (2,2'-dihydroxyphenylpropane) carbonate, polydiethyleneglycol bis(allyl carbonate), polymethylmethacrylate and polystyrene, or blends thereof.
30. A coated polymeric substrate according to any one of claims 27 to 29, wherein the polymeric substrate includes a pre-coated film in the form of either a hardcoat, an inorganic oxide, or a thin metal film, or a combination of such pre-coated films.
31 . A polymeric substrate coated in accordance with the method of any one of claims 13 to 26.
PCT/AU2013/000047 2012-01-24 2013-01-24 Chromium-based reflective coating WO2013110122A1 (en)

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US14/374,376 US9181616B2 (en) 2012-01-24 2013-01-24 Chromium-based reflective coating
JP2014553579A JP6251189B2 (en) 2012-01-24 2013-01-24 Reflective coating based on chromium
CN201380012348.6A CN104302803B (en) 2012-01-24 2013-01-24 Reflectance coating based on chromium
EP13740802.7A EP2807284B1 (en) 2012-01-24 2013-01-24 Chromium-based reflective coating
US14/936,024 US9656601B2 (en) 2012-01-24 2015-11-09 Coated polymeric substrates
US15/439,188 US10703281B2 (en) 2012-01-24 2017-02-22 Reflective coatings and mirrors using same
US15/589,043 US10508788B2 (en) 2012-01-24 2017-05-08 Multifunction lamp unit and rear view device therewith
US15/607,894 US10744947B2 (en) 2012-01-24 2017-05-30 Head section for a rear view device
US15/800,413 US20180126910A1 (en) 2012-01-24 2017-11-01 Rearview device with moveable head assembly
US15/922,366 US10661714B2 (en) 2012-01-24 2018-03-15 Rearview device with moveable head assembly and method
US15/956,091 US10479266B2 (en) 2012-01-24 2018-04-18 Multifunction lamp unit and rear view device therewith
US16/001,423 US10894507B1 (en) 2012-01-24 2018-06-06 Reflective coatings and rearview assembly device for displaying state of vehicle
US16/757,834 US11273764B2 (en) 2012-01-24 2018-10-31 External rearview device, external rearview device kit and vehicle
US16/569,270 US10766423B2 (en) 2012-01-24 2019-09-12 Light emitting mirror bezel
US16/572,061 US10969080B2 (en) 2012-01-24 2019-09-16 Light efficiency methods for vehicular HTL systems
US16/590,891 US11519585B2 (en) 2012-01-24 2019-10-02 Covering devices for use with vehicle parts
US16/801,703 US11220217B2 (en) 2013-01-24 2020-02-26 Rearview device with moveable head assembly and method of assembling same
US16/993,635 US11273766B2 (en) 2012-01-24 2020-08-14 Light emitting mirror bezel
US17/212,121 US20210213882A1 (en) 2012-01-24 2021-03-25 Camera cradle assembly for rear view device
US17/401,976 US20210370835A1 (en) 2012-01-24 2021-08-13 Rearview device with moveable head assembly
US17/587,931 US20220176878A1 (en) 2012-01-24 2022-01-28 Rear View Device With Actuator And Gasket Sealing Head Mover
US17/680,658 US20220176880A1 (en) 2012-01-24 2022-02-25 External rearview device, external rearview device kit and vehicle
US17/939,264 US11890989B2 (en) 2012-01-24 2022-09-07 External rearview device, external rearview device kit and vehicle
US18/166,749 US11878629B2 (en) 2012-01-24 2023-02-09 Light emitting mirror bezel
US18/485,365 US20240042935A1 (en) 2012-01-24 2023-10-12 Light Emitting Mirror Bezel

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US16/459,051 Continuation-In-Part US11479164B2 (en) 2012-01-24 2019-07-01 Sealing means, base assembly with such a sealing means and rear view device with such a base assembly

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US9181616B2 (en) 2015-11-10

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